English  |  正體中文  |  简体中文  |  全文筆數/總筆數 : 18076/20274 (89%)
造訪人次 : 5278595      線上人數 : 1168
RC Version 7.0 © Powered By DSPACE, MIT. Enhanced by NTU Library IR team.
搜尋範圍 查詢小技巧:
  • 您可在西文檢索詞彙前後加上"雙引號",以獲取較精準的檢索結果
  • 若欲以作者姓名搜尋,建議至進階搜尋限定作者欄位,可獲得較完整資料
  • 進階搜尋
    請使用永久網址來引用或連結此文件: https://ir.cnu.edu.tw/handle/310902800/29704


    標題: Degradation of dimethyl sulfoxide through fluidized-bed Fenton process
    作者: Matira, Emmanuela M.
    Chen, Teng-Chien
    Lu, Ming-Chun
    Dalida, Maria Lourdes P.
    貢獻者: 環境資源管理系
    關鍵字: advancedoxidationprocesses
    lcdwaste-water
    biologicaltreatment
    hydroxylradicals
    activatedcarbon
    kinetics
    reagent
    removal
    technology
    mechanisms
    日期: 2015-12
    上傳時間: 2016-04-19 19:05:15 (UTC+8)
    出版者: Elsevier Science Bv
    摘要: Dimethyl sulfoxide (DMSO), one of the most widely used solvent, was subjected to fluidized-bed Fenton oxidation in this study. Fenton oxidation is considered one of the cheapest advanced oxidation processes due to high availability of Fenton's reagents Fe2+ and H2O2, wherein, Fe2+ catalyzes hydroxyl radical production from H2O2. Fluidized-bed Fenton process is a modified approach which is also used to address the production of large amount of iron oxide sludge in conventional Fenton process. Parametric study is included in this research using initial conditions of pH 2-7, 0.5-7.25 mM Fe2+, 5-87.5 mM H2O2, and 5-50 mM DMSO. Fluidized-bed Fenton oxidation of 5 mM DMSO using 68.97 g/L SiO2 carrier at initial conditions of pH 3, 5 mM Fe2+, and 32.5 mM H2O2 resulted to 95.22% DMSO degradation, 34.38% TOC removal and 0.304 mM sulfate/mM DMSO0 production in 2 h. The study shows that the intermediate product which was most difficult to oxidize and contributed most to the residual TOC was methanesulfonate
    關聯: Journal of Hazardous Materials, v.300, pp.218-226
    顯示於類別:[環境資源管理系(所)] 期刊論文

    文件中的檔案:

    檔案 描述 大小格式瀏覽次數
    index.html0KbHTML1785檢視/開啟


    在CNU IR中所有的資料項目都受到原著作權保護.

    TAIR相關文章

    DSpace Software Copyright © 2002-2004  MIT &  Hewlett-Packard  /   Enhanced by   NTU Library IR team Copyright ©   - 回饋