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    Please use this identifier to cite or link to this item: http://ir.cnu.edu.tw/handle/310902800/28578

    標題: Factors affecting degradation of dimethyl sulfoxide (DMSO) by fluidized-bed Fenton process
    作者: Bellotindos, Luzvisminda M.
    Lu, Meng-Hsuan
    Methatham, Thanakorn
    Lu, Ming-Chun
    貢獻者: 環境資源管理系
    關鍵字: Dimethyl sulfoxide
    Advance oxidation process
    Fluidized-bed Fenton
    Fenton's reagents
    Heterogeneous catalysis
    日期: 2014-12
    上傳時間: 2015-05-06 21:21:20 (UTC+8)
    出版者: Springer Heidelberg
    摘要: In this study, the target compound is dimethyl sulfoxide (DMSO), which is used as a photoresist stripping solvent in the semiconductor and thin-film transistor liquid crystal display (TFT-LCD) manufacturing processes. The effects of the operating parameters (pH, Fe2+ and H2O2 concentrations) on the degradation of DMSO in the fluidized-bed Fenton process were examined. This study used the Box-Behnken design (BBD) to investigate the optimum conditions of DMSO degradation. The highest DMSO removal was 98 % for pH 3, when the H2O2 to Fe2+ molar ratio was 12. At pH 2 and 4, the highest DMSO removal was 82 %, when the H2O2 to Fe2+ molar ratio was 6.5. The correlation of DMSO removal showed that the effect of the parameters on DMSO removal followed the order Fe2+> H2O2 > pH. From the BBD prediction, the optimum conditions were pH 3, 5 mM of Fe2+, and 60 mM of H2O2. The difference between the experimental value (98 %) and the predicted value (96 %) was not significant. The removal efficiencies of DMSO, chemical oxygen demand (COD), total organic carbon (TOC), and iron in the fluidized-bed Fenton process were higher than those in the traditional Fenton process.
    關聯: Environmental Science and Pollution Research, v.21 n.24, pp.14158-14165
    Appears in Collections:[環境資源管理系(所)] 期刊論文

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