本研究將自組裝單分子膜(Self-Assem-bled Monolayers, SAM)之技術應用於銦錫氧化物(indium tin oxide, ITO)表面改質上，並利用靜態接觸角(Contact Angle)和原子力顯微鏡(Atomic Force Microscopy)來分析SAM改質後ITO表面的特性。研究結果顯示phenyl-triethoxysilane (PTES)矽烷分子在ITO表面上所形成單分子膜，會受反應溫度及溶劑等因素而影響。反應溫度為25℃時，反應速度較慢，隨著反應時間增加，水在ITO基板表面的接觸角逐漸上升，當反應60分鐘後表面的接觸角趨近一穩定值（約60°）。基板表面粗糙度因PTES單分子膜的形成而上升，且有少量微小聚集體的產生。反之，當反應溫度提高至60℃時，接觸角因反應速率的增加而迅速上升，而且形成較多量的聚集結構，這是因為溶液相反應速率增加所造成的結果。溶劑中的含水量是影響單分子膜反應的另一重要因素，當甲苯溶劑中含水量額外增加時，會增快PTES單分子膜反應速率及聚集現象。 The effects of reaction temperature and solvent on the formation behavior of phenyl-triethoxysilane (PTES) monolayer self-assembled on indium tin oxide (ITO) were studied in this work. The surface properties of the modified ITO substrates were characterized by the measurements of contact angles and by an atomic force microscopy (AFM). The results show that at a low reaction temperature (25℃), the contact angle of water on the modified ITO surface increases gradually with the reaction time and approaches a steady state value (about 60°) after 60 minutes. Although the roughness of the ITO surface becomes higher after the formation of PTES self-assembled monolayer (SAM), few aggregates were observed at the low reaction temperature. At a higher reaction temperature (60℃), the rapid increase of contact angle indicates a higher assembling rate of the monolayer. However, significant amounts of aggregates formed on the ITO surface, attributable to the preferred reactions performed in the bulk solution rather than on the ITO surface. The reaction rate can also be increased by adding extra amounts of water to the solvent (toluene). However, a great number of aggregates accumulated due to the increased water concentration in the solvent.